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Use of silicon block process step to camouflage a false...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate

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Use of silicon block process step to camouflage a false...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
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Use of silicon containing gas for CD and profile feature...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Use of silicon containing imaging layer to define...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Use of silicon germanium and other alloys as the replacement...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Use of silicon oxynitride ARC for metal layers

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
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Use of silicon oxynitride as a sacrificial material for...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Use of silyating agents

Semiconductor device manufacturing: process – Chemical etching
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Use of silyating agents

Semiconductor device manufacturing: process – Chemical etching
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Use of slurry waste composition to determine the amount of...

Semiconductor device manufacturing: process – With measuring or testing
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Use of stop layer for chemical mechanical polishing of CU damasc

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Use of supercritical fluid for low effective dielectric...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Use of Ta-capped metal line to improve formation of memory...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Use of TEOS oxides in integrated circuit fabrication processes

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Use of TEOS oxides in integrated circuit fabrication processes

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Use of tertiarybutylbis-(dimethylamino)phosphine in forming semi

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Patent

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Use of TiCl.sub.4 etchback process during integrated CVD-Ti/TiN

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Use of titanium hydride in integrated circuit fabrication

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Use of ultra-high magnetic fields in resputter and plasma...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Use of voids between elements in semiconductor structures...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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