Use of silicon block process step to camouflage a false...

Details Use of silicon block process step to camouflage a false... Use of silicon block process step to camouflage a false...

2008-03-18

2008-03-18

Cao, Phat X (Department: 2814)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having schottky gate

C438S184000, C438S303000, C257SE21438

Reexamination Certificate

active

07344932

ABSTRACT:
A technique for and structures for camouflaging an integrated circuit structure. A layer of conductive material having a controlled outline is disposed to provide artifact edges of the conductive material that resemble an operable device when in fact the device is not operable.

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