Use of silyating agents

Details Use of silyating agents Use of silyating agents

2004-07-19

2008-09-16

Sarkar, Asok K. (Department: 2891)

Semiconductor device manufacturing: process

Chemical etching

C438S725000, C438S780000, C438S787000, C257SE21560

Reexamination Certificate

active

07425505

ABSTRACT:
The present invention provides improvements to the use of silyating agents in semiconductor processing. More particularly, the silyating agents may be provided in combination with a substantially non-flammable ether, so that the combination is substantially non-flammable. Additionally, the silyating agent may be utilized in vapor form, or applied in conjunction with the electromagnetic radiation. Each of these embodiments can enhance the usability of the silyating agent, i.e., by rendering the silyating agent more safe, more easily utilized in a variety of processing equipment and/or by enhancing the passivation efficacy/efficiency of the silyating agent.

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