Reduced degradation of metal oxide ceramic due to diffusion...
Reduced dielectric breakdown/leakage semiconductor device...
Reduced dielectric breakdown/leakage semiconductor device...
Reduced dielectric constant spacer materials integration for...
Reduced diffusion of a mobile specie from a metal oxide...
Reduced dopant deactivation of source/drain extensions using...
Reduced dry etching lag
Reduced electromigration and stressed induced migration of...
Reduced filler particle size encapsulant for reduction in die su
Reduced fluorine contamination for tungsten CVD
Reduced hydrogen sidewall spacer oxide
Reduced leakage antifuse fabrication method
Reduced leakage interconnect structure
Reduced leakage trench isolation
Reduced leakage trench isolation
Reduced mask CMOS salicided process
Reduced mask count buried layer process
Reduced mask count process for manufacture of mosgated device
Reduced mask process for manufacture of MOS gated devices using
Reduced masking step CMOS transistor formation using...