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Deposition of nano-crystal silicon using a single wafer chamber

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Deposition of nanoporous silic films using a closed cup coater

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of nanoporous silica films using a closed cup coater

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of passivation layers for active matrix liquid...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Deposition of permanent polymer structures for OLED fabrication

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
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Deposition of phosphosilicate glass film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of polycrystal Si film

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Deposition of semiconductor layer by plasma process

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Deposition of silicon dioxide and silicon oxynitride using bis(t

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of silicon germanium on silicon-on-insulator...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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Deposition of silicon layers for active matrix liquid...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Deposition of silicon-containing films from hexachlorodisilane

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Deposition of stable dielectric films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of super thin PECVD SiO.sub.2 in multiple deposition

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of tensile and compressive stressed materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Deposition of titanium amides

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of titanium nitride films having improved uniformity

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of titanium oxide film containing droping element...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
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Deposition of transition metal carbides

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Deposition of tungsten films from W(CO)6

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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