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Apparatus for forming strontium-tantalum-oxide thin film

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Plasma
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Boron ion delivery system

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Carrier gas modification for preservation of mask layer...

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Continuous forming method for functional deposited films

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Direct gas-phase doping of semiconductor wafers using an organic

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Direct gas-phase doping of semiconductor wafers using an organic

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Direct gas-phase doping of semiconductor wafers using an organic

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Dose control technique for plasma doping in ultra-shallow...

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Enhanced plasma mode and system for plasma immersion ion...

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Impurity doping method

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Integrated circuit device and fabrication using metal-doped...

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Integrated circuits having low resistivity contacts and the...

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Ion implantation with heavy halogenide compounds

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Isotopically-enriched boron-containing compounds, and...

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Method and apparatus for forming a cavity in a semiconductor...

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Method and apparatus for improving film stability of halogen-dop

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Method and apparatus for plasma processing

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Method and system for modifying a gate dielectric stack...

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Method for controlling the morphology of deposited silicon on a

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Method for fabricating a semiconductor device for reducing a...

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