Boron ion delivery system

Details Boron ion delivery system Boron ion delivery system

2007-07-03

2007-07-03

Smith, Zandra V. (Department: 2822)

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

Plasma

C438S514000, C250S492210

Reexamination Certificate

active

10667277

ABSTRACT:
A boron ion plasma, generated by use of a cathodic arc, is manipulated and delivered to a large flat product such as a silicon wafer with boron ion energies suitable for incorporation of boron atoms into solid state devices as one of the key steps in manufacturing solid state electronics and with uniformity of boron dose over the area suitable for the scale of manufacturing desired.

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