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Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

Silicon-oxynitride-oxide (SXO) continuity film pad to...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Silicon-ozone CVD with reduced pattern loading using...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

Simox substrate and method for production thereof

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Implanting to form insulator

SIMOX using controlled water vapor for oxygen implants

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

SIMOX using controlled water vapor for oxygen implants

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Simplified method to reduce or eliminate STI oxide divots

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Simplified shallow trench isolation formation with no polish sto

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive...

Single and dual damascene techniques utilizing composite...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

Single electron transistor using porous silicon and...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

Smoothing method for cleaved films made using a release layer

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Soft edge induced local oxidation of silicon

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

SOI chip with mesa isolation and recess resistant regions

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

SOI device and method of isolation thereof

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

SOI device with different silicon thicknesses

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Field plate electrode

SOI LDMOS structure with improved switching characteristics

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

SOI semiconductor configuration and method of fabricating...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – And gettering of substrate

SOI semiconductor device having gettering layer and method...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

SOI structure with a deep thin oxide layer prepared by ION impla

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

SOI substrate and a method for fabricating the same