Integrated circuit support structures and their fabrication
Integrated circuit system using dual damascene process
Integrated circuit system with dummy region
Integrated circuit trenched features and method of producing...
Integrated circuit trenched features and method of producing...
Integrated circuit trenched features and method of producing...
Integrated circuit using a dual poly process
Integrated circuit which uses a damascene process for producing
Integrated circuit with a metal silicide film uniformly formed
Integrated circuit with a recessed conductive layer
Integrated circuit with a reduced pad bump area and the...
Integrated circuit with improved contact barrier
Integrated circuit with improved interconnect structure and...
Integrated circuit with modified metal features and method...
Integrated circuit with planarized dielectric layer between succ
Integrated circuit with reverse engineering protection
Integrated circuit with self-aligned line and via and...
Integrated circuit with simultaneous fabrication of dual...
Integrated circuit with stop layer and associated...
Integrated circuit with stop layer and method of...