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Use of fluorine implantation to form a charge balanced...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Use of inductively-coupled plasma in plasma-enhanced...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Use of linear injectors to deposit uniform selective ozone...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

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Use of linear injectors to deposit uniform selective ozone...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

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Use of linear injectors to deposit uniform selective ozone...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Use of multifunctional si-based oligomer/polymer for the...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Use of oxalyl chloride to form chloride-doped silicon dioxide fi

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate

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Use of phoslon (PNO) for borderless contact fabrication,...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Use of selective ozone TEOS oxide to create variable...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Use of SiD.sub.4 for deposition of ultra thin and controllable o

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers

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Using H2anneal to improve the electrical characteristics of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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Using polydentate ligands for sealing pores in low-k...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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UV cure process and tool for low k film formation

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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UV pretreatment process for ultra-thin oxynitride formation

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

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UV-enhanced oxy-nitridation of semiconductor substrates

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate

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