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Method of forming a doped metal oxide dielectric film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a dual-layer anti-reflective coating

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Method of forming a film by using plasmanized process gas contai

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a film having enhanced reflow...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Utilizing reflow
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Method of forming a fluorine-added insulating film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent

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Method of forming a fluorocarbon polymer film on a substrate...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a gate dielectric by in-situ plasma

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Method of forming a gate insulator in group III-V nitride...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming a high quality gate oxide at low temperatures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming a high quality gate oxide layer having a...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a high quality layer of BST

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a layer comprising tungsten oxide

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a layer on a semiconductor substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming a light emitting device with a...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a low dielectric constant film with...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a low leakage dielectric layer providing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a metal gate electrode

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming a metal nitride layer over exposed copper

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Method of forming a metal oxide film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a metal oxide film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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