Tri-level resist process for fine resolution photolithography
Trilayer microlithographic process using a silicon-based resist
Tunabale vapor deposited materials as antireflective...
Tungsten hard mask for dry etching aluminum-containing layers
Two layer dye photoresist process for sub-half micrometer resolu
Two mask photoresist exposure pattern for dense and isolated...
Two mask photoresist exposure pattern for dense and isolated...
Two pass process for producing a fine pitch lead frame by...
Two stage etching process for through the substrate contacts
Two-layered TSI process for dual damascene patterning
Ultra-fine microfabrication method using a fast atomic energy be
Ultra-thin resist and oxide/nitride hard mask for metal etch
Ultra-thin resist and SiON/oxide hard mask for metal etch
Ultraviolet curing of photosensitive polyimides
Underlayer compositions for multilayer lithographic processes
Upside down bake plate to make vertical and negative...
Use of base developers as immersion lithography fluid
Use of chromeless phase shift features to pattern large area...
Use of DARC and BARC in flash memory processing
Use of dual mask processing of different composition such as...