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Tri-level resist process for fine resolution photolithography

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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Trilayer microlithographic process using a silicon-based resist

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Tunabale vapor deposited materials as antireflective...

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Tungsten hard mask for dry etching aluminum-containing layers

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Two layer dye photoresist process for sub-half micrometer resolu

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Two mask photoresist exposure pattern for dense and isolated...

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Two mask photoresist exposure pattern for dense and isolated...

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Two pass process for producing a fine pitch lead frame by...

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Two stage etching process for through the substrate contacts

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Two-layered TSI process for dual damascene patterning

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Ultra-fine microfabrication method using a fast atomic energy be

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Ultra-thin resist and oxide/nitride hard mask for metal etch

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Ultra-thin resist and SiON/oxide hard mask for metal etch

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Ultraviolet curing of photosensitive polyimides

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Underlayer compositions for multilayer lithographic processes

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Upside down bake plate to make vertical and negative...

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Use of base developers as immersion lithography fluid

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Use of chromeless phase shift features to pattern large area...

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Use of DARC and BARC in flash memory processing

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Use of dual mask processing of different composition such as...

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