Use of dual mask processing of different composition such as...

Details Use of dual mask processing of different composition such as... Use of dual mask processing of different composition such as...

2011-03-22

2011-03-22

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

Reexamination Certificate

active

07910289

ABSTRACT:
In accordance with the invention, there are methods of making an integrated circuit, an integrated circuit device, and a computer readable medium. A method can comprise forming a first layer over a semiconductor substrate, forming a first mask layer over the semiconductor substrate, and using the first mask layer to pattern first features. The method can also include forming a second mask layer over the first features, using the second mask layer to pattern portions of the first features, removing the second mask layer, and removing the first mask layer.

REFERENCES:
patent: 2002/0001975 (2002-01-01), Lee
patent: 2002/0059557 (2002-05-01), Shin et al.
patent: 2004/0043623 (2004-03-01), Liu et al.
patent: 2005/0032371 (2005-02-01), An et al.
patent: 2005/0142497 (2005-06-01), Ryou et al.
patent: 2005/0191852 (2005-09-01), Takigawa et al.
patent: 2005/0250330 (2005-11-01), Chen et al.
patent: 2006/0046484 (2006-03-01), Abatchev et al.

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