Use of base developers as immersion lithography fluid

Details Use of base developers as immersion lithography fluid Use of base developers as immersion lithography fluid

2006-06-06

2006-06-06

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S322000

Reexamination Certificate

active

07056646

ABSTRACT:
Disclosed are immersion lithography methods involving using a base developer as an immersion lithography fluid. Consequently, it is unnecessary to contact a developer with an irradiated resist after the immersion lithography fluid is removed.

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Hoffnagle et al., “Liquid Immersion Deep-ultraviolet Interferometric Lithography”, J. Vac. Sci. Technol. B 17(6), Nov./Dec. 1999, pp. 3306-3309.

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