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(Cyclo)aliphatic epoxy compounds

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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(Meth) acrylate derivative, polymer and photoresist...

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(Meth)acrylate compound having aromatic acid labile group,...

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(Meth)acrylate derivative, polymer and photoresist...

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(Meth)acrylate, polymer photoresist composition, and pattern...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
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(Meth)acrylate, polymer, photoresist composition, and...

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(Meth)acrylates containing urethane groups

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(Meth)acrylates having lactone structure, polymers,...

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.alpha.,.beta. Diketone containing polymers as positive photores

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0.3 Micron aperture width patterning process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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1,3-Diaza-9-thia-anthracene-2,4-diones and photopolymerizable mi

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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1,4 or 9,10 dimethoxyanthracene triggers for 2-tri(chloro or bro

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1,4-dihydropyridine-containing IR-sensitive composition and...

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10-Phenyl-1,3,9-triazaanthracenes and photopolymerizable mixture

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193 nm positive-working photoresist composition

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193nm resist with improved post-exposure properties

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1Postitve-working imaging composition and element and method of

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2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a proc

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2-acylamino-9-arylacridines, process for their preparation and p

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2-cyano-3,3-diarylacrylate UV dyes for laser recording process

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