Ultra-fine microfabrication method using a fast atomic energy be
Ultra-thin resist and oxide/nitride hard mask for metal etch
Ultra-thin resist and SiON/oxide hard mask for metal etch
Ultraviolet curing of photosensitive polyimides
Underlayer compositions for multilayer lithographic processes
Upside down bake plate to make vertical and negative...
Use of base developers as immersion lithography fluid
Use of chromeless phase shift features to pattern large area...
Use of DARC and BARC in flash memory processing
Use of dual mask processing of different composition such as...
Use of mixed bases to enhance patterned resist profiles on...
Use of pedestals to fabricate contact openings
Use of perfluoro-n-alkanes in vacuum ultraviolet applications
Use of surface coupling agent to improve adhesion
UV absorbing glass cloth and use thereof
UV-curable compositions and method of use thereof in...
UV-enhanced silylation process to increase etch resistance...