Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2008-05-06
2008-05-06
Huff, Mark F. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S394000, C430S312000
Reexamination Certificate
active
10925123
ABSTRACT:
There is provided a method of making plurality of features in a first layer. A photoresist layer is formed over the first layer. Dense regions in the photoresist layer are exposed through a first mask under a first set of illumination conditions. Isolated regions in the photoresist layer are exposed through a second mask different from the first mask under a second set of illumination conditions different from the first set of illumination conditions. The exposed photoresist layer is patterned and then the first layer is patterned using the patterned photoresist layer as a mask.
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Bell Scott A.
Kim Hung-Eil
Lukanc Todd P.
Okoroanyanwu Uzodinma
Plat Marina V.
Advanced Micro Devices , Inc.
Foley & Lardner LLP
Huff Mark F.
Sullivan Caleen O.
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