Sequential chemical vapor deposition
Silicon dioxide film forming method
Silicon nitride deposition
Single substrate processing film forming method
Single-substrate-processing CVD method of forming film...
Substrate having uniform tungsten silicide film and method of ma
Substrate support member with a purge gas channel and pumping sy
Surface pre-treatment for enhancement of nucleation of high...
Synthesis of metal oxide and oxynitride
Synthesis of W-Si-N films by chemical vapor deposition using WF.
Tantalum amide complexes for depositing tantalum-containing...
Tantalum amide precursors for deposition of tantalum nitride...
Tantalum compound, process of producing the same, and material f
Textile fabric and yarn composed of synthetic fibers,...
Thermal barrier coating and process therefor
Titanium nitride and multilayers formed by chemical vapor deposi
Titanium tantalum nitride silicide layer
Transient enhanced atomic layer deposition
Use of integrated polygen deposition and RTP for...
Vacuum deposition process and apparatus for producing films havi