Substrate support member with a purge gas channel and pumping sy

Details Substrate support member with a purge gas channel and pumping sy Substrate support member with a purge gas channel and pumping sy

1998-06-24

2000-03-21

Tentoni, Leo B.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

118728, 427255392, C23C 1606, C23C 1644

Patent

active

060400110

ABSTRACT:
The present invention discloses susceptor used in vacuum CVD chambers which provides a purge gas delivery and removal system that inhibits the deposition of process gas on the edge and back side of a substrate, while providing access to the entire surface of the substrate for processing. The susceptor has a substrate receiving surface having a perimeter. A purge gas such as argon is passed over the perimeter of the surface using a purge gas system having an inlet disposed adjacent to the substrate receiving surface. The purge gas is removed by a pump system having an outlet disposed adjacent to the substrate receiving surface.

REFERENCES:
patent: 5447570 (1995-09-01), Schmitz et al.
patent: 5516367 (1996-05-01), Lei et al.
patent: 5556476 (1996-09-01), Lei et al.
patent: 5882417 (1999-03-01), van de Ven et al.

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