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Pressure control system for semiconductor manufacturing equipmen

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Process and apparatus for low pressure chemical vapor deposition

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process and apparatus for producing high purity oxidation on a s

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process and apparatus for supplying zinc vapor continuously to a

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process and apparatus for the simultaneous deposition of a prote

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process chamber sleeve with ring seals for isolating individual

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process chamber with inner support

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process for producing photoconductive member and apparatus for p

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process for the manufacture of deposition films and apparatus th

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process of vapor growth of gallium nitride and its apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Process system with transfer unit for object to be processed

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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Processed body carrying device, and processing system with...

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Processing apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Processing apparatus and processing system

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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Processing method and equipment for processing a semiconductor d

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Processing system for semiconductor device manufacture of otherw

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Production of high-purity polycrystalline silicon rod for semico

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Purified silicon production system

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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