Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-04-16
1997-09-16
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Multizone chamber
156345, 20429825, 20429835, C23C 1600
Patent
active
056675925
ABSTRACT:
A modular semiconductor wafer processing system comprises a plurality of detachable process reactors and other types of generators that can be attached to any of several ports on the lid of a circular wafer handling chamber. A multiple-spoke single-axis rigid-arm transfer carousel centrally located within the circular wafer handling chamber has access to the respective process areas beneath each port in the lid. A set of independent cylindrical sleeves with sealing rings are provided to rise up from the floor of the circular wafer handling chamber to contact and seal against the lid to isolate each of the process stations. The multiple-spoke single-axis rigid-arm transfer carousel is automatically positioned out of the way before the cylindrical rings are raised and sealed.
REFERENCES:
patent: 4715921 (1987-12-01), Maher et al.
patent: 4733631 (1988-03-01), Boyarsky
patent: 4830700 (1989-05-01), Davis et al.
patent: 4832778 (1989-05-01), Davis et al.
patent: 4906328 (1990-03-01), Freeman et al.
patent: 4915777 (1990-04-01), Jucha et al.
patent: 5019233 (1991-05-01), Blake
patent: 5076205 (1991-12-01), Vowles
patent: 5169478 (1992-12-01), Miyamoto et al.
patent: 5205919 (1993-04-01), Zejda
patent: 5281295 (1994-01-01), Maeda et al.
patent: 5281320 (1994-01-01), Turner et al.
patent: 5288379 (1994-02-01), Namiki
patent: 5292393 (1994-03-01), Maydan et al.
patent: 5302209 (1994-04-01), Maeda et al.
patent: 5308431 (1994-05-01), Maher et al.
patent: 5330633 (1994-07-01), Matsumoto
patent: 5364219 (1994-11-01), Takahashi
patent: 5376223 (1994-12-01), Salimian et al.
Boitnott Charles A.
Caughran James W.
Egbert Steve
Breneman R. Bruce
Gasonics International
Lund Jeffrie R.
Schatzel Thomas E.
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