Processing apparatus

Details Processing apparatus Processing apparatus

1994-03-07

1996-07-16

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 414217, 414938, C23C 1600

Patent

active

055363202

ABSTRACT:
A waiting space is provided below a processing vessel for processing objects to be processed. An objects to be processed mount which is movable up and down into the processing vessel is disposed in the waiting space for mounting objects to be processed. There is provided a natural oxide film generation suppressing gas supply system which supplies a natural oxide film generation suppressing gas for suppressing generation of natural oxide films on the surfaces of the objects to be processed, and a dried gas with a low dew point is supplied as a natural oxide film generation suppressing gas by the natural oxide film generation suppressing gas supply system. The processing apparatus can suppress generation of natural oxide films inexpensively and efficiently.

REFERENCES:
patent: 4962726 (1990-10-01), Matsushita
patent: 5219464 (1993-06-01), Yamaga et al.
patent: 5221201 (1993-06-01), Yamaga et al.
patent: 5236181 (1993-08-01), Ishii et al.
patent: 5261167 (1993-11-01), Sakata

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