Process and apparatus for supplying zinc vapor continuously to a

Coating apparatus – Gas or vapor deposition – Multizone chamber

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118724, 118725, 118726, 4272552, C23C 1600, C23C 1400

Patent

active

053839692

ABSTRACT:
A process and apparatus for the manufacture of chemical vapor deposition deposited structures which comprises supplying a solid zinc metal continuously to a heated retort at a controlled rate. The retort is a body of refractory material having a top and a bottom and a traverse cross section which decreases from the top to the bottom of the retort. The zinc is melted, vaporized, and conveyed to a chemical vapor deposition zone defined by a number of heated mandrel plates where it is reacted with either hydrogen sulfide or hydrogen selenide to form a chemical vapor deposited structure. The process and apparatus provide for improved control over the evaporation rate of zinc and a reduction in the furnace volume needed to melt and vaporize the zinc.

REFERENCES:
patent: 2554902 (1948-05-01), Godley, 2nd
patent: 2914643 (1959-11-01), Fields et al.
patent: 3086496 (1963-04-01), Strong
patent: 3086889 (1963-04-01), Strong
patent: 3097113 (1963-07-01), Welsh
patent: 3541301 (1970-11-01), Gallet
patent: 3750623 (1973-08-01), Carpenter et al.
patent: 4353938 (1982-10-01), Sterling et al.
patent: 4811691 (1989-03-01), McJilton

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