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Planarization on an embedded dynamic random access memory

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Planarization process

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Planarization process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Planarization process

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Planarization process for semiconductor substrates

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Planarization process for semiconductor substrates

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Planarization process to achieve improved uniformity across...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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Planarization process using artificial gravity

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Planarization process using tailored etchback and CMP

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Planarization slurry including a dispersant and method of using

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Planarization stop layer in phase change memory integration

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having air-gap dielectric
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Planarization system

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Planarization system and method using a carbonate containing...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Planarization technique for DRAM cell capacitor electrode

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Planarization using laser ablation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Planarization using plasma oxidized amorphous silicon

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Planarization using plasma oxidized amorphous silicon

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Planarization using plasma oxidized amorphous silicon

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Planarized and silicided trench contact

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Planarized capacitor array structure for high density memory app

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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