Oxide-nitride stack gate dielectric
Oxide/nitride stacked in FinFET spacer process
Oxidizing pretreatment of ONO layer for flash memory
Oxygen elimination for device processing
Oxygen implant self-aligned, floating gate and isolation structu
Oxygen implantation for reduction of junction capacitance in...
Oxygen ion implantation procedure to increase the surface area o
Oxygen-rich layers underlying BPSG
Oxynitride bilayer formed using a precursor inducing a high...
Oxynitride laminate “blocking layer” for thin...