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Oxide-nitride stack gate dielectric

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxide/nitride stacked in FinFET spacer process

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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Oxidizing pretreatment of ONO layer for flash memory

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxygen elimination for device processing

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxygen implant self-aligned, floating gate and isolation structu

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxygen implantation for reduction of junction capacitance in...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxygen ion implantation procedure to increase the surface area o

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxygen-rich layers underlying BPSG

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxynitride bilayer formed using a precursor inducing a high...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Oxynitride laminate “blocking layer” for thin...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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