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Real time particle monitor inside of plasma chamber during...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Real-time gate etch critical dimension control by oxygen...

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Real-time multi-zone semiconductor wafer temperature and process

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Reduced thickness variation in a material layer deposited in...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Refractive index system monitor and control for immersion...

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Run-to-run etch control by feeding forward measured metal...

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Semiconductor device and method for producing the same

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Semiconductor device fabrication method and fabrication...

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Semiconductor device fabrication method and fabrication...

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Semiconductor device inspection and analysis method and its...

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Semiconductor device manufacturing method

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Semiconductor processing workpiece support with sensory subsyste

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Semiconductor processing workpiece support with sensory...

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Semiconductor thin film manufacturing method

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Semiconductor wafer treatment method, semiconductor wafer...

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Signal layer for generating characteristic optical plasma...

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Situ measurement of film nitridation using optical emission...

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System and method for controlling an electrochemical etch...

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System and method for determining and controlling contamination

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System and method for determining and controlling contamination

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