Refractive index system monitor and control for immersion...

Details Refractive index system monitor and control for immersion... Refractive index system monitor and control for immersion...

2005-01-18

2005-01-18

Pert, Evan (Department: 2829)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C430S030000

Reexamination Certificate

active

06844206

ABSTRACT:
A system and/or method are disclosed for measuring and/or controlling refractive index (n) and/or lithographic constant (k) of an immersion medium utilized in connection with immersion lithography. A known grating structure is built upon a substrate. A refractive index monitoring component facilitates measuring and/or controlling the immersion medium by utilizing detected light scattered from the known grating structure.

REFERENCES:
patent: 5900354 (1999-05-01), Batchelder
patent: 6781670 (2004-08-01), Krautschik

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