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Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

High temperature local oxidation of silicon for fine line patter

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High temperature sensors utilizing doping controlled,...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High throughput chemical vapor deposition process capable of fil

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High voltage integrated switching devices on a bonded and...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-frequency line

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-frequency wireless communication system on a single ultrath

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-quality SGOI by annealing near the alloy melting point

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-quality SGOI by annealing near the alloy melting point

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive...

High-voltage device substrate structure and method of fabricatio

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Hybrid trench isolation technology for high voltage...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Identifying yield-relevant process parameters in integrated...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature

III-nitride device and method with variable epitaxial growth...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive...

Implant method to improve characteristics of high voltage...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

Implant N2 into a pad oxide film to mask the active region...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

Implantation process using substoichiometric, oxygen doses...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

Implanted isolation structure formation for high density CMOS in

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Impurity ion segregation precluding layer, fabrication...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

In situ hardmask pullback using an in situ plasma resist...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

In situ hardmask pullback using an in situ plasma resist...