Advanced CMOS isolation utilizing enhanced oxidation by light io
Alternative process for BPTEOS/BPSG layer formation
Charge trapping memory cell
CMOS isolation utilizing enhanced oxidation of recessed porous s
Device isolation methods for a semiconductor device
Enhanced silicon-on-insulator (SOI) transistors and methods...
Fabrication method of a device isolation structure
Field oxidation by implanted oxygen (FIMOX)
Ion implant method for topographic feature corner rounding
Ion implantation for scalability of isolation in an...
Method for controlling dislocation positions in silicon...
Method for forming an SOI substrate by use of a plasma ion...
Method for forming isolation regions subsequent to gate formatio
Method for patterning a buried oxide thickness for a...
Method of doping field-effect-transistors (FETs) with...
Method of forming a thin oxide layer having improved...
Method of forming planar isolation and substrate contacts in...
Method of improving flash memory performance
Method of manufacture of an integrated circuit system with...
Method to fabricate completely isolated silicon regions