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Low-dielectric silicon nitride film and method of forming...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low-K dielectric constant CVD precursors formed of cyclic...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low-K Dielectric layer and method of making same

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low-k dielectric materials and processes

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low-temperature dielectric film formation by chemical vapor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low-temperature plasma-enhanced chemical vapor deposition of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Lower temperature method for forming high quality...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Lower temperature method for forming high quality...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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LPCVD furnace uniformity improvement by temperature ramp...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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