Low-k dielectric materials and processes

Details Low-k dielectric materials and processes Low-k dielectric materials and processes

2005-06-14

2005-06-14

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S787000, C427S255120, C427S255390

Reexamination Certificate

active

06905981

ABSTRACT:
Improved dielectric materials suitable for use in integrated circuits and computer systems are provided by a chemical vapor deposition process employing fluoroalkane precursors.

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