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Chemical-mechanical polishing process

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

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Chemical-mechanical polishing slurry and method

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemical-mechanical polishing system having a bi-material...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemical-mechanical-polishing slurry and method for...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemical-mechanical-polishing station

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemical/mechanical polishing slurry, and chemical...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemically preventing Cu dendrite formation and growth by...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemically removable Cu CMP slurry abrasive

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Utility Patent

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Chemically removable Cu CMP slurry abrasive

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chuck for supporting wafers with a fluid

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Circumferentially oscillating carousel apparatus for sequentiall

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

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Circumferentially oscillating carousel apparatus for...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Clean method for recessed conductive barriers

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cleaning agent for semiconductor parts and method for...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cleaning brush conditioning apparatus

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cluster tool method using plasma immersion ion implantation

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

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CMP apparatus and method for polishing multiple...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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CMP composition containing organic nitro compounds

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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CMP compositions for low-k dielectric materials

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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CMP in-situ conditioning with pad and retaining ring clean

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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