Cluster tool method using plasma immersion ion implantation

Details Cluster tool method using plasma immersion ion implantation Cluster tool method using plasma immersion ion implantation

1998-07-28

2000-11-28

Hitesha, Felisa

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

438690, 438692, 438710, 438712, H01L 21302

Patent

active

061535249

ABSTRACT:
A cluster tool method using plasma immersion ion implantation chamber. In some embodiments, the cluster tool method also includes a controlled cleaving process chamber, as well as others.

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