Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent
1999-07-26
2000-10-24
Powell, William
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
156345, 438745, H01L 2100
Patent
active
06136715&
ABSTRACT:
A polishing apparatus including a plurality of polishing pads on respective rotating platens. The polishing platens, and therefore the attached pads also, may be of substantially different diameters. Multiple wafer heads can simultaneously polish multiple wafers on the multiple polishing pads or at different positions on one of the pads. The wafer heads are suspended from a rotatable carousel, which provides positioning of the heads relative to the polishing surfaces. Additionally, a loading/unloading station is provided. The carousel selectively positions the heads on the polishing surfaces, or positions one of the heads over the loading/unloading station while the remaining heads are located over polishing stations for substrate polishing, at which positions the wafers can be polished. The carousel can rotate to sweep all wafer heads attached thereto over respective polishing pads that they overlie.
REFERENCES:
patent: 3142942 (1964-08-01), Celovsky
patent: 3292312 (1966-12-01), Snyder
patent: 3377750 (1968-04-01), Day
patent: 3505766 (1970-04-01), Boettcher et al.
patent: 3518798 (1970-07-01), Boettcher
patent: 3631634 (1972-01-01), Weber
patent: 3665648 (1972-05-01), Yamanaka
patent: 3731435 (1973-05-01), Boettcher et al.
patent: 3813825 (1974-06-01), Weber et al.
patent: 3857123 (1974-12-01), Walsh
patent: 3913271 (1975-10-01), Boettcher
patent: 4481741 (1984-11-01), Bouladon et al.
patent: 4583325 (1986-04-01), Tabuchi
patent: 5224304 (1993-07-01), Cesna
patent: 5333413 (1994-08-01), Hahimoto
patent: 5367545 (1994-11-01), Nakamura
patent: 5498199 (1996-03-01), Karlsrud et al.
patent: 5951373 (1999-09-01), Shendon et al.
Bartlett William R.
Shendon Norm
Applied Materials Inc.
Powell William
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