Optical wavelength division multiplexed...
Optical-mechanical feature fabrication during manufacture of...
Optically controlled imaging phase mask element
Optically semitransmissive film, photomask blank and...
Optically structured filter and process for its production
Optimized alternating phase shifted mask design
Organic bottom antireflective coating for high performance...
Orthogonally separated phase shifted and unphase shifted mask pa
Overlay measuring pattern, and photomask
Overlay target exposure device utilizing pitch determination...
Overlay target for polarized light lithography
Overlying shifter type phase shift photomask blank, overlying sh
Oxide layer patterned by vapor phase etching
Oxide structure having a finely calibrated thickness
Partial collective mask for a charged particle beam
Partial one-shot electron beam exposure mask and method of formi
Pattern compensation for stitching
Pattern compensation techniques for charged particle...
Pattern delineating apparatus for use in the EUV spectrum
Pattern density tailoring for etching of advanced...