Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-01-03
2006-01-03
Duda, Kathleen (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S396000
Reexamination Certificate
active
06982135
ABSTRACT:
A method for transferring a pattern from a mask to a substrate (or wafer), comprises dividing a mask generation data file into a plurality of segments. The segments include a main pattern area and a stitching area. Each stitching area contains a respective common pattern. An image of an illuminated portion of the main pattern area is formed. Connection ends of the segments in a substrate area (or wafer area) are illuminated with an illumination beam. An image of the illuminated portion of the main pattern area is formed, and a halftone gray level dosage distribution is produced in the substrate area (or wafer area) corresponding to the common pattern. The common patterns of adjacent segments substantially overlap in the substrate area (or wafer area).
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Chang Chung-Hsing
Chen Jeng-Horng
Chin Chih-Cheng
Ho Bang-Ching
Liang Fu-Jye
Duane Morris LLP
Duda Kathleen
Koffs Steven E.
Taiwan Semiconductor Manufacturing Co. Ltd.
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