Pattern compensation techniques for charged particle...

Details Pattern compensation techniques for charged particle... Pattern compensation techniques for charged particle...

2006-06-27

2006-06-27

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S296000, C430S942000

Reexamination Certificate

active

07067220

ABSTRACT:
A method of producing a particle beam mask and mask structures to allow for the use of dummy fill shapes. This invention overcomes distortion in by adding a dummy shape in unexposed regions and applying a blocking layer to cover the dummy shape. The blocking layer is comprised of an aperture or additional mask mounted close to the mask or can be added to the mask itself.

REFERENCES:
patent: 5942760 (1999-08-01), Thompson et al.
patent: 6221537 (2001-04-01), Thompson et al.

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