Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-11-17
1995-12-05
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430323, 430324, 430394, G03F 900
Patent
active
054728142
ABSTRACT:
A structure and fabrication method for an alternating-element phase-shifting mask (Alt PSM) wherein all the mask pattern components extending in a first direction, such as the x direction are formed on a first mask substrate and all the mask pattern components extending in a second direction orthogonal to the first direction, such as the y direction, are formed on a second mask substrate. The two mask substrates are either combined together in a single mask for a single exposure step on a wafer, or separate exposures may be made through each mask and superimposed on a single wafer.
REFERENCES:
patent: 5153083 (1993-10-01), Garofalo et al.
patent: 5246800 (1993-09-01), Muray
patent: 5260152 (1993-11-01), Shimizu et al.
patent: 5268244 (1993-12-01), Yoo
patent: 5273850 (1993-12-01), Lee et al.
patent: 5275895 (1994-01-01), Kusunose
patent: 5279896 (1994-01-01), Tokunagu et al.
patent: 5286581 (1994-02-01), Lee
patent: 5288569 (1994-02-01), Lin
patent: 5391441 (1995-02-01), Imai et al.
Marc D. Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask," I.E.E.E. Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982.
International Business Machines - Corporation
Rosasco S.
LandOfFree
Orthogonally separated phase shifted and unphase shifted mask pa does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Orthogonally separated phase shifted and unphase shifted mask pa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Orthogonally separated phase shifted and unphase shifted mask pa will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1373271