Ultra-short channel NMOSFETS with self-aligned silicide contact
Ultraviolet and vacuum ultraviolet transparent polymer...
Ultraviolet and vacuum ultraviolet transparent polymer...
Use of a planarizing layer to improve multilayer performance...
Use of attenuating phase-shifting mask for improved printability
Use of attenuating phase-shifting mask for improved...
Use of calcium fluoride substrate for lithography masks
Use of intersecting subresolution features for microlithography
Use of partially fluorinated polymers in applications...
Use of soft adhesive to attach pellicle to reticle
Using (LaNiO.sub.3) .sub.X (TiO.sup.2) .sub.1-X and (LaNiO.sub.3
Using (LaNiO.sub.3).sub.X (TiO.sub.2).sub.1-x oxide absorption c
Using different transmittance with attenuate phase shift...
Using double exposure effects during phase shifting to...
Using new pattern fracturing rules for optical proximity...
Using perfluoropoly-ethers to form pellicles
Using second exposure to assist a PSM exposure in printing a...
Using thin films as etch stop in EUV mask fabrication process
Utilizing compensation features in photolithography for...
Utilizing vacuum ultraviolet (VUV) exposure to remove halos...