Selected acid generating agents and their use in processes...

Selected block copolymer novolak binder resins in radiation-sens

Selected block phenolic oligomers and their use in radiation-sen

Selected high thermal novolaks and positive-working radiation-se

Selected o-quinonediazide sulfonic acid esters of phenolic compo

Selected photoactive methylolated cyclohexanol compounds and the

Selected trihydroxybenzophenone compounds and their use in photo

Self-developing radiation sensitive resist with amorphous polyme

Sesamol/aldehyde condensation products as sensitivity enhancers

Silicon containing negative resist for DUV, I-line or E-beam lit

Silicon-containing novolak resin and resist material and pattern

Silicon-containing positive resist and use in multilayer metal s

Siloxane polymers and positive working light-sensitive compositi

Single exposure positive contact multilayer photosolubilizable l

Solid transfer negative- or positive-working color proofing elem

Solubilization-inhibitor and positive resist composition

Solvent resistant polymers with improved bakeability features

Speed enhancers for acid sensitized resists

Stabilization of diazo-resin sensitizers with polyvinyl pyridine

Stabilized photosensitive screen printing dispersion composition