Silicon-containing positive resist and use in multilayer metal s

Details Silicon-containing positive resist and use in multilayer metal s Silicon-containing positive resist and use in multilayer metal s

1994-07-13

1995-06-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430166, 430192, 430193, 430313, 430317, 430323, 430327, G03F 7021, G03F 7075, G03F 736

Patent

active

054222230

ABSTRACT:
Photosensitive silicon-containing resist compositions comprising hydroxyphenylsilsesquioxanes and siloxanes partially estersified with diazonaphthoquinone sulfonyloxy groups for imageable O.sub.2 RIE barrier films. Methods for forming image patterns on substrates using these photosensitive silicon-containing resist compositions are also provided.

REFERENCES:
patent: 4745169 (1988-05-01), Sugiyama et al.
patent: 4770897 (1988-09-01), Wu
patent: 4789648 (1988-12-01), Chow et al.
patent: 4992596 (1991-02-01), Jeffries, III et al.
patent: 5115090 (1992-05-01), Sachdev et al.
A. Tanaka, et al., Journal of Vacuum Science & Technology B7, "Resolution Characteristics of a Novel Silicone-based Positive Photoresist", May/Jun., 1989, No. 3, New York.

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