Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-02-01
1996-07-30
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 534557, G03F 7023
Patent
active
055410332
ABSTRACT:
A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a positive photoresist composition and process for forming patterned image. Further the invention is drawn to a positive photoresist composition comprising an alkali-soluble resin and quinone diazide sulfonic acid triesters and diesters characterized by their HPLC peak areas.
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patent: 5407779 (1995-04-01), Uetani et al.
Blakeney Andrew J.
Ferreira Lawrence
Medina Arturo N.
Tadros Sobhy
Toukhy Medhat A.
Chu John S. Y.
OCG Microelectronic Materials Inc.
Simons William A.
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