Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-06-04
1993-02-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 430326, 528155, G03F 7023, G03F 732
Patent
active
051889218
ABSTRACT:
A block copolymer novolak resin composition comprising at least one unit of the reaction product of an alkali-soluble phenolic moiety having at least two phenolic nuclei and at least two unsubstituted positions ortho and para to the hydroxyls in the moiety and a reactive ortho, ortho bonded oligomer having the formula: ##STR1## wherein x is from 2 to 7; wherein R is selected from hydrogen a lower alkyl group or lower alkoxy group having 1-4 carbon atoms and a halogen group; and Y.sub.1 is either a hydroxyl group; an alkoxy group or a halogen group; and Y.sub.2 is hydrogen, alkyl, alkoxy, halogen, hydroxyl, --CH.sub.2 OH, --CH.sub.2 -- halogen, or --CH.sub.2 -alkoxy group.
REFERENCES:
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4555469 (1985-11-01), Erdmann et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4826821 (1989-05-01), Clements
patent: 4835204 (1989-05-01), Carfagnini
patent: 4837121 (1989-06-01), Blakeney et al.
Chatterjee, S. K., "Non-aqueous Titration of Polynuclear Phenolic Compounds: Part IV--Titration of Some High Molecular Weight Synthetic Compounds of Uniform Constitution", Jun. 1969, pp. 605-610.
Chatterjee, S. K. et al., "Correlation of Composition and DP of Some 3-Component Phenolic Block Copolymers with Their Titration Curves in Nonaqueous Media", 1981, pp. 717-727.
Chatterjee, S. K. et al, "Dissociation Behavior of Some Mixtures of Synthetic Phenolic Oligomers in Nonaqueous Media", 1978, pp. 1031-1039.
Chatterjee, S. K., "Effect of Substitutents on the Composition and Dissociation Behavior or Some Four Component Phenolic Copolymers", Oct. 1981.
Chatterjee, S. K. et al., "Study of Electrochemical Properties and Formation of Some Phenolic Block Copolymers", 1983, pp. 93-103.
Blakeney Andrew J.
Honda Kenji
Jeffries, III Alfred T.
Tadros Sobhy
Bowers Jr. Charles L.
Chu John S.
OCG Microelectronic Materials Inc.
Simons William A.
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