Speed enhancers for acid sensitized resists

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430270, 430914, 430918, 522 15, 522 25, 522 31, 522 32, G03F 7021, G03F 7038

Patent

active

051642786

ABSTRACT:
Acid sensitized photoresists with enhanced photospeed are provided. The photoresist compositions include a polymer binder and/or a polymerizable compound and an acid sensitive group which enables patterning of the resist composition, and acid generating photoinitiator, and an hydroxy aromatic compound which enhances the speed of the resist composition under imaging radiation.

REFERENCES:
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4506003 (1985-03-01), Ruckert et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4868092 (1989-09-01), Kawabata et al.
patent: 4994346 (1991-02-01), Meier et al.
English translation of 63-97944 (Konishiroku) Japan.

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