Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-03-01
1992-11-17
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430914, 430918, 522 15, 522 25, 522 31, 522 32, G03F 7021, G03F 7038
Patent
active
051642786
ABSTRACT:
Acid sensitized photoresists with enhanced photospeed are provided. The photoresist compositions include a polymer binder and/or a polymerizable compound and an acid sensitive group which enables patterning of the resist composition, and acid generating photoinitiator, and an hydroxy aromatic compound which enhances the speed of the resist composition under imaging radiation.
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patent: 4506003 (1985-03-01), Ruckert et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4868092 (1989-09-01), Kawabata et al.
patent: 4994346 (1991-02-01), Meier et al.
English translation of 63-97944 (Konishiroku) Japan.
Brunsvold William R.
Knors Christopher J.
Montgomery Melvin W.
Moreau Wayne M.
Welsh Kevin M.
Crockatt Dale M.
Hamilton Cynthia
International Business Machines - Corporation
Stemwedel John A.
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