Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-10-28
1984-10-16
Bowers, Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430141, 430145, 430176, 430308, 430325, G03C 160, G03F 708, G03F 712
Patent
active
044775520
ABSTRACT:
Light-sensitive compositions and materials incorporating such compositions, such as coated films for the production of polymeric resists, comprise a diazo-resin as a sensitizer for the composition and a water-soluble or water-dispersible colloid. In order to stabilize the diazo-resin sensitizer and increase the time between manufacture and use of such light-sensitive compositions and material, a poly-(vinylpyridine) is incorporated in the composition, preferably in the form of a water-soluble salt such as the hydrochloride or sulphate.
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patent: 4247615 (1981-01-01), McGuckin et al.
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 321-326.
Day Peter M. G.
Jones John W.
Sperry John A.
Autotype International Limited
Bowers Charles L.
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