Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-06-04
1993-03-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 430326, 528155, G03F 7023, G03F 732
Patent
active
051962896
ABSTRACT:
Block phenolic oligomers of the formula (I): ##STR1## These may be reacted alone or with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II): ##STR2##
REFERENCES:
patent: 3384618 (1968-05-01), Imoto et al.
patent: 3422068 (1969-01-01), Kreibich et al.
patent: 4146739 (1979-03-01), Akutin et al.
patent: 4345054 (1982-08-01), Takeda et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4555469 (1985-11-01), Erdmann et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4703086 (1987-10-01), Yamamoto et al.
patent: 4731319 (1989-03-01), Kohara et al.
patent: 4826821 (1989-05-01), Clements
patent: 4835204 (1989-05-01), Carfagnini
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 4876324 (1989-10-01), Nakano et al.
Chatterjee, S. K. "Non-Aqueous Titration of Polynuclear Phenolic Compounds: Part IV--Titration of Some High Molecular Weight Synthetic Compounds of Uniform Constitution", Jun. 1969, pp. 605-610.
Chatterjee et al. "Correlation of Composition and DP of Some 3-Component Phenolic Block Copolymers with Their Titration Curves in Nonaqueous Media", 1981, pp. 717-727.
Chatterjee et al. "Dissociation Behavior of Some Mixtures of Synthetic Phenolic Oligomers in Nonaqueous Media", 1978, pp. 1031-1039.
Chatterjee et al. "Effect of Substituents on the Composition and Dissociation Behavior or Some Four Component Phenolic Copolymers", Oct. 1981.
Chatterjee et al. "Study of Electrochemical Properties and Formation of Some Phenolic Block Copolymers", 1983, pp. 93-103.
Blakeney Andrew J.
Honda Kenji
Jeffries, III Alfred T.
Tadros Sobhy
Bowers Jr. Charles L.
Chu John S.
OCG Microelectronic Materials Inc.
Simons William A.
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