Self-developing radiation sensitive resist with amorphous polyme

Details Self-developing radiation sensitive resist with amorphous polyme Self-developing radiation sensitive resist with amorphous polyme

1987-12-08

1990-01-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430270, 430296, 430297, 430326, 430328, 430942, 430966, 430967, G03C 1495

Patent

active

048973360

ABSTRACT:
A self-developing radiation resist having extremely high sensitivity to energetic radiation, which resist is resistant to dry etching. The energetic radiation includes electron beam radiation, ion beam radiation, x-ray radiation, and gamma ray radiation. The resist is substantially amorphous; it has extremely high values of G.sub.s and G.sub.m, where

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