Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-08-03
1993-04-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 430270, 430914, G03C 152
Patent
active
052022170
ABSTRACT:
A positive resist composition comprising an aromatic group-containing alkali-soluble resin and a compound having an ammonium salt as skeleton, as the main components.
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Solid State Technology, vol. 24, No. 8, Aug. 1981, Washington US pp. 81-85; Chandross E. A. et al. "Photoresists for Deep UV Lith . . . ".
Sato Shinji
Seita Toru
Shibata Katuya
Taniguchi Takashi
Todoko Masaaki
Bowers Jr. Charles L.
Huff Mark F.
Tosoh Corporation
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