Siloxane polymers and positive working light-sensitive compositi

Details Siloxane polymers and positive working light-sensitive compositi Siloxane polymers and positive working light-sensitive compositi

1992-08-28

1994-08-16

Berman, Susan

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430278, 430270, 430286, 430921, 430925, 522 31, 522 32, 522 59, 522 66, 522 67, 522 29, 522172, 528 26, 528 27, 528 28, C08G 7704, G03C 154, G03C 1735, G03C 1675

Patent

active

053386400

ABSTRACT:
A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

REFERENCES:
patent: 4689288 (1987-08-01), Buiguez et al.
patent: 4689289 (1987-08-01), Crivello
patent: 4722881 (1988-02-01), Ueno et al.
patent: 5002853 (1991-03-01), Aoai et al.
patent: 5075199 (1991-12-01), Schwalm et al.
patent: 5110709 (1992-05-01), Aoai et al.
patent: 5141840 (1992-08-01), Mizutani et al.
patent: 5143816 (1992-09-01), Mizutani et al.
patent: 5217843 (1993-06-01), Dammel et al.
patent: 5225316 (1993-07-01), Vogel et al.

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