Collimated x-ray source for x-ray lithographic system

Column simultaneously focusing a particle beam and an...

Combinations of deflection chopping systems for minimizing...

Combined multiple beam size and spiral scan method for electron

Combined on-axis and off-axis illumination

Compact high current broad beam ion implanter

Compact multi-bounce projection system for extreme...

Compact photoemission source, field and objective lens...

Configuration management and retrieval system for proton...

Configuration management and retrieval system for proton...

Contact opening metrology

Contamination barrier and lithographic apparatus comprising...

Contamination barrier and lithographic apparatus comprising...

Contamination control on lithography components

Contamination reduction during ion implantation

Continuously variable aperture for high-energy ion implanter

Continuously writing electron beam stitched pattern exposure sys

Contrast enhancement of electron beam alignment marks

Control mechanisms for dosimetry control in ion implantation sys

Control of exposure in charged-particle-beam...